To measure the shape of a wavefront with accuracy which is not varied at all the time, through simple signal processing.
A wavefront measuring device comprises an image input section 1, a spot detection section 2, a linear component removal section 3, a Fourier analysis section 4, and a wavefront aberration output section 5. The image input section 1 inputs an image. The spot detection section 2 detects the position of a spot which is formed from the image by a microlens array. The linear component removal section 3 removes a linear component of a positional displacement amount of the spot based on the detected position of the spot. The Fourier analysis section 4 calculates an aberration as a spatial frequency component by performing Fourier transformation on the positional displacement amount of the spot from which the linear component has been removed. The wavefront aberration output section 5 outputs the aberration calculated by the Fourier transformation section 4.
| JP2004317376A | 2004-11-11 |
| US20120099075A1 | 2012-04-26 | |||
| US20110153248A1 | 2011-06-23 | |||
| US20060132709A1 | 2006-06-22 | |||
| US20040119942A1 | 2004-06-24 |
Suzuki Kenchi
Kajinami order
Kazuhiro Oyaku
Shunichi Ueda
Junichiro Yoshida
Satoshi Iino
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