Title:
WAVELENGTH STANDARD FOR EXCIMER LASER
Document Type and Number:
Japanese Patent JP3068056
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To calibrate a wavelength meter, by roughly determining the wavelength of an ArF laser, by tuning the laser to an arbitrary absorption line of gas, and by fine-tuning the laser to an absorption line near a final wavelength.
SOLUTION: First, the wavelength of an ArF laser 103 is roughly determined, the laser 103 emits a laser beam A, and the laser beam A enters a wavelength detection system 105. The system 105 directs A1 that is one part of the laser beam A to a photoelectric detector 120 by using a splitter 118 and a mirror 119. An intensity level outputted from the photoelectric detector 120 is detected by a processor 134, an operation for controlling a wavelength adjuster 136 is executed, and the laser beam A is tuned to an arbitrary absorption line of gas. Furthermore, switches 120 and 130 are switched, the photoelectric detector 130 is connected to the processor 134, and the laser beam A is fine-tuned to the absorption line near a final wavelength.
Inventors:
Paraspidus
Richard El Sandstrom
Igor Formenkov
Richard El Sandstrom
Igor Formenkov
Application Number:
JP19938798A
Publication Date:
July 24, 2000
Filing Date:
July 15, 1998
Export Citation:
Assignee:
Cymer Incorporated
International Classes:
G01M11/00; G01J3/02; G01J3/06; G01J9/00; G03F7/20; H01S3/00; H01S3/03; H01S3/034; H01S3/13; H01S3/134; H01S3/137; H01S3/225; H01S3/139; (IPC1-7): H01S3/137; G01J3/02; G01J3/06; H01S3/00
Domestic Patent References:
| JP1272175A |
Other References:
【文献】米国特許5450207(US,A)
Attorney, Agent or Firm:
Minoru Nakamura (7 outside)