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Title:
WET PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2015179747
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a wet processing apparatus capable of implementing uniform substrate processing.SOLUTION: A wet processing apparatus comprises a substrate holder feeding mechanism 50 for moving a substrate holder 42 while immersing a substrate W in a process liquid. The substrate holder feeding mechanism 50 raises a movable support stand 52 to lift up the substrate holder 42 until the substrate holder 42 is separated from a fixed support stand 59; makes the movable support stand 52 with the substrate holder 42 move toward a holder output position OUT by predetermined distance; lowers the movable support stand 52 until the substrate holder 42 is supported by the fixed support stand 59 and the movable support stand 52 is separated from the substrate holder 42; and makes the movable support stand 52 move toward a holder input position IN by predetermined distance.

Inventors:
NAKAGAWA YOICHI
MUKOYAMA YOSHITAKA
Application Number:
JP2014056714A
Publication Date:
October 08, 2015
Filing Date:
March 19, 2014
Export Citation:
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Assignee:
EBARA CORP
International Classes:
H01L21/677; B65G49/02; C23C18/31; C23F1/08
Domestic Patent References:
JPH06151677A1994-05-31
JP2003298211A2003-10-17
JP2001518704A2001-10-16
JP2003277995A2003-10-02
JPH06260460A1994-09-16
JPS6182970A1986-04-26
Attorney, Agent or Firm:
Isamu Watanabe
Tetsuya Hirosawa



 
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