Title:
WET TYPE DETACHABLE SILICON-CONTAINING ANTIREFLECTION AGENT
Document Type and Number:
Japanese Patent JP2017020000
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a silicon-containing antireflection material having desired etching selectivity during pattern transfer used for a process using a plurality of layers with a mask for pattern transfer and capable of easily being removed by a wet type chemical treatment.SOLUTION: There is provided a siloxane polymer containing one or more first monomer represented by the formula (1) and a dimer thereof and one or more second monomer represented by the formula (2) or a dimer thereof as polymerization units. There is provided a siloxane polymer, where ≥30% of polymer containing the monomer contain one or more functional part selected from hydroxy, mercapto, epoxy, glycidyloxy or the like and no monomer of the formula HSiX3 and SiX4 as a polymerization unit. R2SiX2(1) RSiX3(2), where R is each independently aryl, aralkyl, alkyl, alkenyl, aralkyl or R, one or more R is R, Ris a C2 to 30 organic group containing one or more -C(O)-O-C(O)- part and each X is a hydrolyzable part.SELECTED DRAWING: None
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Inventors:
OWENDI ONGAYI
CHARLOTTE CUTLER
LI MINGQI
YAMADA SHINTARO
JAMES CAMERON
CHARLOTTE CUTLER
LI MINGQI
YAMADA SHINTARO
JAMES CAMERON
Application Number:
JP2016111352A
Publication Date:
January 26, 2017
Filing Date:
June 02, 2016
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C08G77/14; C08L83/06; G03F7/11
Domestic Patent References:
| JP2009019093A | 2009-01-29 | |||
| JP2009079219A | 2009-04-16 | |||
| JP2009265595A | 2009-11-12 | |||
| JP2010039051A | 2010-02-18 | |||
| JP2010039056A | 2010-02-18 | |||
| JP2012123391A | 2012-06-28 | |||
| JP2013117722A | 2013-06-13 | |||
| JP2015055876A | 2015-03-23 | |||
| JPH03100021A | 1991-04-25 |
Foreign References:
| WO2013031985A1 | 2013-03-07 | |||
| WO2014126013A1 | 2014-08-21 | |||
| WO2014080908A1 | 2014-05-30 | |||
| WO2016052268A1 | 2016-04-07 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office