Title:
INTEGRATED ANODE AND ACTIVATED REACTIVE GAS SOURCE FOR USE IN MAGNETRON SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JP2017222931
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an integrated anode and activated reactive gas source for use in a magnetron sputtering device and a magnetron sputtering device incorporating the same.SOLUTION: The integrated anode and activated reactive gas source comprises: a vessel having an interior conductive surface having an anode; and an insulated outer body isolated from the chamber walls of a coating chamber. The vessel has a single opening with a circumference smaller than that of a vessel in communication with the coating chamber. Sputtering gas and reactive gas are coupled through an input port into the vessel and through the single opening into the coating chamber. A plasma is ignited by high-density electrons coming from the cathode and returning to the power supply through the anode. A relatively low anode voltage is sufficient to maintain a plasma of activated reactive gas to form stoichiometric dielectric coatings.SELECTED DRAWING: Figure 4B
Inventors:
OCKENFUSS GEORG J
Application Number:
JP2017150021A
Publication Date:
December 21, 2017
Filing Date:
August 02, 2017
Export Citation:
Assignee:
VIAVI SOLUTIONS INC
International Classes:
C23C14/34; C23C14/35; H05H1/46
Domestic Patent References:
| JP2006057184A | 2006-03-02 | |||
| JP2000226652A | 2000-08-15 | |||
| JP2002069632A | 2002-03-08 | |||
| JP2001522509A | 2001-11-13 |
Attorney, Agent or Firm:
Kiyoshi Tanaka
Murayama Midori
Murayama Midori