Title:
INTERMEDIATE OF VAPOR DEPOSITION MASK DEVICE
Document Type and Number:
Japanese Patent JP2017222932
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask device, capable of suppressing a vapor deposition mask from being deformed and improving the accuracy of vapor deposition patterning.SOLUTION: A method for manufacturing a vapor deposition mask device comprises: preparing a vapor deposition mask 50 having a protective film, which includes a sheet-like vapor deposition mask 20 including a metal base material 21 and a protective film 84 provided on one surface of the vapor deposition mask 20 and having transparency to a laser beam; placing the vapor deposition mask 50 having the protective film on a metal frame 15 so as to arrange the metal base material 21 on the side of the metal frame 15; irradiating the laser beam from the side of the protective film 84 to weld the metal base material 21 to the metal frame 15; and removing the protective film 84 from the vapor deposition mask 20.SELECTED DRAWING: Figure 22
Inventors:
YAMADA JUNICHI
Application Number:
JP2017177002A
Publication Date:
December 21, 2017
Filing Date:
September 14, 2017
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP2009052072A | 2009-03-12 | |||
| JP2004225077A | 2004-08-12 | |||
| JP2003272839A | 2003-09-26 | |||
| JP2009052073A | 2009-03-12 | |||
| JP2013163864A | 2013-08-22 | |||
| JP2009094349A | 2009-04-30 | |||
| JP2012004281A | 2012-01-05 |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuya Yamashita
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuya Yamashita