The constituent for coating on a photoresist pattern - Merck Patent Gesellschaft mit beschraenkter Haftung

Title:

The constituent for coating on a photoresist pattern

Document Type and Number:

Japanese Patent JP6012600

Kind Code:

B2

Abstract:

The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.

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Inventors:

Wu Hempen
Lee Men
Khao Yi
In Ian
Lee Dong Kwan
Hong Seung-Yoon
Pawnesque Margareta

Application Number:

JP2013521242A

Publication Date:

October 25, 2016

Filing Date:

July 27, 2011

Export Citation:

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Assignee:

Merck Patent Gesellschaft mit beschraenkter Haftung

International Classes:

C09D7/80; G03F7/40; H01L21/027

Domestic Patent References:

JP2008198862A
JP2010113345A
JP2010066597A
JP2006048035A
JP2004205699A

Foreign References:

WO2010032796A1

Attorney, Agent or Firm:

Mitsufumi Esaki
Blacksmith
Katsunori Uenishi
Ichiro Torayama

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