Title:
An exposure device, an exposure method, and a device manufacturing method
Document Type and Number:
Japanese Patent JP5979254
Kind Code:
B2
Abstract:
A plurality of heads configuring an encoder system is arranged on a wafer table, and positional information of a wafer table in the XY plane is measured, based on an output of a head opposed to a scale plate (21) (diffraction grating (RG)). And, a relative position (including relative attitude and rotation) of each head, for example, of a head (60C) with the wafer table is measured herein by a measurement system (64) arranged inside the head. Accordingly, by correcting the positional information based on the information of the relative position which has been measured, a highly precise measurement of the positional information of the wafer table becomes possible even in the case when the position (attitude, rotation) of the head changes with the movement of the wafer table.
More Like This:
Inventors:
Kanaya Yuho
Application Number:
JP2015000735A
Publication Date:
August 24, 2016
Filing Date:
January 06, 2015
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G01B11/00; H01L21/68
Domestic Patent References:
| JP2007071874A | ||||
| JP2000323404A | ||||
| JP2006186380A | ||||
| JP2007129194A |
Foreign References:
| WO2007083758A1 | ||||
| WO2007097466A1 | ||||
| WO2008029757A1 | ||||
| WO2007097379A1 | ||||
| WO2008026739A1 |
Attorney, Agent or Firm:
Atsushi Tateishi
Previous Patent: A cross current current control control device of a power inverter circuit
Next Patent: JPS5979255
Next Patent: JPS5979255