Title:
ハイドレート構造を有するフッ素含有感光性ポリマー及びこれを含むレジスト組成物
Document Type and Number:
Japanese Patent JP4160374
Kind Code:
B2
Abstract:
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 containing repeat units with a group of formula (R1) or (R2). Independent claims are also included for (1) photosensitive polymers (IA) with units (a) as above and units (b) derived from (meth)acrylate, maleic anhydride, norbornene, styrene, tetrafluoroethylene and/or sulfur dioxide; and (2) resist preparations containing polymers as above and photo-acid generators (PAG)
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Inventors:
Yun
Common sense
Song Ki-ho
Cui Ai Shun
Common sense
Song Ki-ho
Cui Ai Shun
Application Number:
JP2002368107A
Publication Date:
October 01, 2008
Filing Date:
December 19, 2002
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
C08F32/04; C08F12/14; C08F32/08; C08F212/06; C08F220/10; C08F232/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2003137940A | ||||
| JP2002311588A | ||||
| JP2001022075A |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani