Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
FOCUS RING AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2017050509
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To stabilize the adsorption characteristics of a focus ring.SOLUTION: In a focus ring placed at the peripheral portion of a lower electrode for placing a substrate in a processing container, and coming into contact with a member of the lower electrode, the contact surface of the focus ring is formed of any one of a silicon-containing material, alumina (AlO) or quartz, and at least any one of the contact surface of the focus ring and the contact surface of a member of the lower electrode has a surface roughness of 0.1 μm or more.SELECTED DRAWING: Figure 3

More Like This:
JPH05259118MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE
JP2023138189SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
WO/2013/190805PLASMA PROCESSING DEVICE AND FILTER UNIT
Inventors:
TOMIOKA TAKETOSHI
SASAKI YASUHARU
KISHI HIROKI
SUH JISOO
Application Number:
JP2015175045A
Publication Date:
March 09, 2017
Filing Date:
September 04, 2015
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/3065
Domestic Patent References:
JP2012134375A2012-07-12
JP2005064460A2005-03-10
JPH0855905A1996-02-27
JPH09213773A1997-08-15
JP2010034256A2010-02-12
JP2012199535A2012-10-18
JP2014003085A2014-01-09
JP2011151280A2011-08-04
JP2016025277A2016-02-08
JP2016184645A2016-10-20
Foreign References:
WO2010109848A12010-09-30
WO2016052291A12016-04-07
US20050061447A12005-03-24
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito



 
Previous Patent: A circuit board and an image forming device

Next Patent: A semiconductor device and an optical coupling device