Title:
GAS MIXER, AND SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2017226863
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technology for uniformly mixing a plurality of kinds of gas.SOLUTION: A gas outflow port 41 is arranged at the bottom center of a cylindrical part 40 of which the top face is closed. A plurality of gas flow guiding walls 42A-42C of rotational symmetry to the center of the cylindrical part 40 are arranged with a space from each other along the opening edge of the gas outflow port 41. One end in the circumferential direction of each of the gas flow guiding walls 42A-42C bends toward the center of the cylindrical part 40. First-third gas inflow tubes 45A-45C are each connected to a position near the other wall in the circumferential direction of the gas flow guiding walls 42A-42C between the gas flow guiding walls 42A-42C and the inner peripheral surface of the cylindrical part 40. Gases supplied from the first-third gas inflow tubes 45A-45C flow along the outer peripheral surface of the gas flow guiding walls 42A-42C and swirl along the inner peripheral surface of the gas flow guiding walls 42A-42C at one side in the circumferential direction and is then mixed at the gas outflow port 41.SELECTED DRAWING: Figure 4
Inventors:
YAMASHITA JUN
Application Number:
JP2016121947A
Publication Date:
December 28, 2017
Filing Date:
June 20, 2016
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/455; B01F23/10; H01L21/31
Attorney, Agent or Firm:
Toshio Inoue
Tomoaki Miida
Tomoaki Miida