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Title:
ガス前処理装置を備えるガス処理装置及び当該ガス前処理装置の洗浄方法
Document Type and Number:
Japanese Patent JP5326187
Kind Code:
B2
Abstract:

To provide a gas treatment apparatus which prevents clogging of microorganism carrier, etc. and effectively removes a gas to be treated containing a S-containing compound.

The gas treatment apparatus removes the S-containing compound from the gas to be treated containing the S-containing compound, wherein the gas treatment apparatus has a treatment tower for making the gas to be treated flow, and has, in the tower, a microorganism carrier for making a contact with the gas to be treated, a water-spraying part for spraying water from the upper part towards the microorganism carrier, an impregnation means for impregnating the microorganism carrier with a washing liquid and a blowing part for blowing from the lower part towards the microorganism carrier.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Seiya Hina
Takaaki Masui
Application Number:
JP2006097069A
Publication Date:
October 30, 2013
Filing Date:
March 31, 2006
Export Citation:
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Assignee:
Kurita Water Industries Ltd.
International Classes:
B01D53/46; B01D53/38; B01D53/52; B01D53/81; C10L3/10
Domestic Patent References:
JP5115742A
JP2003311121A
JP2003305328A
JP2000041670A
JP2003265920A
JP2099120A
JP4030020U
JP2003154230A
Attorney, Agent or Firm:
Kaoru Watanabe



 
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