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Title:
POLISHING PROCESSOR AND POLISHING PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2018111149
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide: a polishing processor capable of sufficiently reducing workpiece chatters; and a polishing processing method.SOLUTION: A polishing processor 1 comprises: grinder side oscillation displacement arithmetic devices 26, 32 that obtain oscillation displacements of an abrasive wheel 23 due to oscillation in approach and alienation directions resultant from imbalance around the rotation axis of the abrasive wheel 23; spindle side oscillation displacement arithmetic devices 27, 33 that obtain oscillation displacements of a workpiece W due to the propagation of the oscillation of the abrasive wheel 23 from an abrasive wheel base 21 through a bed 10 in approach and alienation directions of the abrasive wheel 23, a relative oscillation displacement arithmetic device 34 that obtains relative oscillation displacements of the abrasive wheel 23 and those of the workpiece W on the basis of obtained oscillation displacements of the abrasive wheel 23 and those of the workpiece W; a position changing part 35 that produces position changing commands for changing a position of the abrasive wheel base 21; and a processing control part 36 that performs the polishing processing of the workpiece W on the basis of produced position changing commands.SELECTED DRAWING: Figure 1

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Inventors:
WATANABE AKIRA
Application Number:
JP2017002055A
Publication Date:
July 19, 2018
Filing Date:
January 10, 2017
Export Citation:
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Assignee:
JTEKT CORP
International Classes:
B24B47/22; B23Q15/12; B23Q17/12; B24B5/02; B24B5/35; B24B41/06; B24B49/04; B24B49/10
Domestic Patent References:
JP2010173014A2010-08-12
JP2011143503A2011-07-28
JP2011161520A2011-08-25
JP2013237127A2013-11-28
Foreign References:
WO2003100374A12003-12-04
Attorney, Agent or Firm:
Kobayashi Osamu
Kiichi Yamamoto
Kimura Gunji