Title:
ハードマスク組成物
Document Type and Number:
Japanese Patent JP7252244
Kind Code:
B2
Abstract:
Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.
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Inventors:
ROBINSON,Alex,P.G.
Dawson, Guy
BROWN,Alan
LADA,Thomas
ROTH,John,L.
JACKSON,Edward,A.
Dawson, Guy
BROWN,Alan
LADA,Thomas
ROTH,John,L.
JACKSON,Edward,A.
Application Number:
JP2020544630A
Publication Date:
April 04, 2023
Filing Date:
February 25, 2019
Export Citation:
Assignee:
ROBINSON,Alex,P.G.
Dawson, Guy
Dawson, Guy
International Classes:
H01L21/312; C01B32/156; C07C13/64; C08K3/04; C08L61/20; C08L63/02; C08L63/04; H01L21/3065
Domestic Patent References:
JP2008164806A | ||||
JP2015513786A | ||||
JP2009167165A | ||||
JP2004533637A |
Foreign References:
WO2017205272A1 | ||||
WO2008126804A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Hiroe Associates Patent Office
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