COMPOUND, ACID GENERATOR, POLYMER, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

COMPOUND, ACID GENERATOR, POLYMER, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2018008930

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a compound capable of producing a resist pattern with good line edge roughness, an acid generator, a polymer, and a resist composition.SOLUTION: The compound is represented by formula (I) [Qand Qare each F; z is 0 or the like; Xand Xare each -COO-, -O-, or the like; Rto Rare each H, CH3, or the like; Xis one of formulae (X-1 to X-8); Ris Ph; and Ris CF3].SELECTED DRAWING: None

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Inventors:

SHIMADA MASAHIKO
ICHIKAWA KOJI

Application Number:

JP2017112531A

Publication Date:

January 18, 2018

Filing Date:

June 07, 2017

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07C309/70; C08F20/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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