Title:
PRODUCTION METHOD OF ANTISTATIC FILM, CONDUCTIVE RELEASE AGENT AND ANTISTATIC FILM
Document Type and Number:
Japanese Patent JP2016187761
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a production method of an antistatic film capable of easily producing the antistatic film having a small amount of an aggregate in a coating film and excellent in the conductivity and peelability of the coating film.SOLUTION: A production method of an antistatic film includes: a conductive release agent preparation step where a silicone emulsion containing a curable silicone is added to a conductive polymer aqueous dispersion containing a π-conjugated system conductive polymer and a polyanion, a platinum-based curing catalyst is not added or the platinum-based curing catalyst is added so as to be a content ratio of 1 ppm or less and then the conductive release agent is prepared; and an antistatic layer formation step where the conductive release agent is applied on at least one surface of a film base material and heated at 200°C or higher and then an antistatic layer is formed.SELECTED DRAWING: None
Inventors:
MATSUBAYASHI SATOSHI
Application Number:
JP2015067926A
Publication Date:
November 04, 2016
Filing Date:
March 30, 2015
Export Citation:
Assignee:
SHINETSU POLYMER CO
International Classes:
B05D7/24; B05D5/00; B05D5/12; B32B7/02; B32B27/00; C08J7/04; C08L65/00; C08L83/04; C08L101/02; C09D5/02; C09D7/12; C09D201/00
Domestic Patent References:
| JP2014080608A | 2014-05-08 | |||
| JP2013086495A | 2013-05-13 |
Other References:
木村達也 (リンテック 技術統括本部): "塗布技術 5.シリコーン薄膜塗工", 接着の技術, vol. 28, no. 2, JPN6018027092, 30 September 2008 (2008-09-30), JP, pages 30 - 36, ISSN: 0003838191
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Suzuki Mitsuyoshi
Tadashi Takahashi
Suzuki Mitsuyoshi
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