Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
A manufacturing method and a manufacture device of a porous semiconductor electrode
Document Type and Number:
Japanese Patent JP5914139
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a porous semiconductor electrode, a method of manufacturing the same, and a manufacturing apparatus, capable of obtaining a porous semiconductor thin film of a constant film thickness.SOLUTION: In a method of manufacturing a porous semiconductor electrode 13 constituted by forming a thin film 12 made from porous semiconductor on a surface of a porous semiconductor substrate 11 having a small hole 11B penetrating from the rear side to the surface side, a placement stage 21 including a placement surface 23 on which the substrate 11 is placed, and a through-hole 26 for releasing gas which is formed at the placement surface 23 and which is capable of exhausting the gas facing the placement surface 23 to the outside is used, to place the substrate 11 on the placement surface 23, for tight contacting between a rear surface of the substrate 11 and the placement surface 23. Porous semiconductor particles 12A which are to be the thin film 12 are sprayed against the surface of the substrate 11 placed on the placement surface 23 by pressurizing gas G, and the pressurizing gas G that has flowed to the rear surface side through the small hole 11B of the substrate 11 is exhausted through the through-hole 26 for releasing gas.

More Like This:
JP6015929The photoelectrical pole for dye-sensitized solar cells, and a dye-sensitized solar cell
JP5978047A manufacturing method of a dye-sensitized solar cell
JPH01124974PHOTO SECONDARY CELL
Inventors:
Keisuke Hirose
Kazumi Hanada
Mitsuru Kono
Toshihisa Fujitaka
Application Number:
JP2012101035A
Publication Date:
May 11, 2016
Filing Date:
April 26, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Nippon Steel & Sumikin Engineering Co., Ltd.
Nippon Steel & Sumikin Chemical Co., Ltd.
International Classes:
H01G9/20; B01J21/06; B01J35/02
Domestic Patent References:
JP2010021091A
JP2006328459A
JP2004039286A
JP2008297184A
Attorney, Agent or Firm:
Intellectual Property Office



 
Previous Patent: A lens manufacturing method and a lens manufacture device

Next Patent: RECORDED INFORMATION REPRODUCER