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Patent Searching and Data


Title:
A manufacturing method of the radical anion of an aromatic nitro compound
Document Type and Number:
Japanese Patent JP6026824
Kind Code:
B2
Inventors:
Takeshi Kimoto
Atsuko Matsuura
Chimoto Kimoto
Application Number:
JP2012194279A
Publication Date:
November 16, 2016
Filing Date:
September 04, 2012
Export Citation:
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Assignee:
Kimoto Electronics Industry Co., Ltd.
International Classes:
C07C201/12; C07C205/06
Domestic Patent References:
JP2014283A
JP3296918A
Foreign References:
US5827501
Other References:
ABE, T. and IKEGAMI, Y.,An anion radical precursor in the nucleophilic substitution of p-dinitrobenzene.,Bull. Chem. Soc. Jpn.,1978年,51(1),p.196-200
LENDZIAN, F. et al.,14N ENDOR of the Nitrobenzene Radical Anion in Solution,Journal of Magnetic Resonance,1981年,44(1),p.20-31
HOSOI, H. et al.,Solvent Effect on Intramolecular Electron Transfer Rate of 1,3-Dinitrobenzene Radical Anion,Chemistry Letters,1998年,p.177-178
SAWYER, D. T. and ROBERTS, JR. J. L. ,Hydroxide Ion: An Effective One-Electron Reducing Agent?,Accounts of Chemical Research,1988年,21,p.469-476
Attorney, Agent or Firm:
Keiichiro Saikyo