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Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2018024641
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern having a good mask error factor (MEF).SOLUTION: The salt has a group represented by formula (aa) [where Xrepresents a C1-C6 alkanetriyl group; Xand Xeach independently represent an oxygen atom or a sulfur atom; ring W represents a C3-C36 aliphatic hydrocarbon ring which may have a substituent, wherein -CH- contained in the aliphatic hydrocarbon ring may be substituted with -O-, -S-, -CO- or -SO-, provided that the ring W has at least one base-dissociable group; and * represents a bond].SELECTED DRAWING: None

Inventors:
MASUYAMA TATSURO
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2017141579A
Publication Date:
February 15, 2018
Filing Date:
July 21, 2017
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D317/72; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
JP2014224984A2014-12-04
JP2016047815A2016-04-07
JP2015157802A2015-09-03
JP2015024989A2015-02-05
JP2002516896A2002-06-11
JP2018024642A2018-02-15
JP2015157801A2015-09-03
JP2015131804A2015-07-23
JP2014209208A2014-11-06
JP2012193160A2012-10-11
JP2011201860A2011-10-13
JP2011037837A2011-02-24
JP2012230363A2012-11-22
JP2017155037A2017-09-07
Other References:
MARZI, MAURO ET AL.: "Efficient enantioselective synthesis of (R)-(-)-carnitine from glycerol", JOURNAL OF ORGANIC CHEMISTRY, vol. 65(20), 6766-6769, JPN6021014846, 2000, ISSN: 0004491893
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto