Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2018024642
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern having a good mask error factor (MEF).SOLUTION: The salt has a group represented by formula (aa1) [where Xand Xeach independently represent an oxygen atom or a sulfur atom; ring Wand ring Weach independently represent a C3-C36 alicyclic hydrocarbon group which may have a substituent, provided that at least one of the ring Wand the ring Whas at least one base-dissociable group; and * represents a bond].SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
FUJITA SHINGO
ICHIKAWA KOJI
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2017141580A
Publication Date:
February 15, 2018
Filing Date:
July 21, 2017
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D317/72; C07C381/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
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Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto