Title:
A manufacturing method of a vapor deposition mask
Document Type and Number:
Japanese Patent JP5966814
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask that can be made light even when it is made large, and by which an opening of a resin mask and a slit of a metal mask can be precisely formed.SOLUTION: A method for manufacturing a vapor deposition mask 100 formed by laminating a metal mask 15 with a slit 16, and a resin mask 25 provided with an opening 50 corresponding to a vapor deposition manufactured pattern comprises the steps of: preparing a metallic plate 10 with a resin layer on one surface of which a resin layer 20 is provided; forming a resin mask 25 on the resin layer by forming an opening corresponding to the vapor deposition manufactured pattern; and forming the metal mask by applying etching from a face side not contacting the resin mask of the metallic plate and forming a slit penetrating through the metallic plate and overlaid on an opening of the resin mask.
More Like This:
Inventors:
Eisuke
Katsuya Obata
Toshihiko Takeda
Katsuya Obata
Toshihiko Takeda
Application Number:
JP2012210181A
Publication Date:
August 10, 2016
Filing Date:
September 24, 2012
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2004190057A | ||||
| JP2013021165A |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yasuo Ishikawa
Yoshinori Ishibashi
Yasuo Ishikawa
Yoshinori Ishibashi