A mask blank, phase shift masks, and these manufacturing methods

Title:

A mask blank, phase shift masks, and these manufacturing methods

Document Type and Number:

Japanese Patent JP6005530

Kind Code:

B2

More Like This:

WO/2018/020994	MASK BLANK SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, TRANSFER MASK MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, MASK BLANK SUBSTRATE, MASK BLANK, AND TRANSFER MASK
JP6715360	Photomask substrate
JPH05257264	MASK FOR EXPOSING AND PRODUCTION THEREOF

Inventors:

Jun Nozawa
Hiroshi Shishido
Kazuya Sakai

Application Number:

JP2013004370A

Publication Date:

October 12, 2016

Filing Date:

January 15, 2013

Export Citation:

Assignee:

HOYA CORPORATION

International Classes:

G03F1/32

Domestic Patent References:

Foreign References:

WO2009123172A1
US5897977

Attorney, Agent or Firm:

Patent business corporation Tsukuni
Hajime Tsukuni
Keiko Ozawa
Akio Shibata

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