Title:
METHOD AND APPARATUS FOR ANALYZING AND REMOVING DEFECT OF EUV PHOTOMASK
Document Type and Number:
Japanese Patent JP2016103041
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure.SOLUTION: The method comprises the steps of: (a) determining first data by exposing a defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) combining the first, the second and the third data.SELECTED DRAWING: Figure 9
Inventors:
MICHAEL BUDACH
TRISTAN BRET
KLAUS EDINGER
THORSTEN HOFMANN
TRISTAN BRET
KLAUS EDINGER
THORSTEN HOFMANN
Application Number:
JP2016029117A
Publication Date:
June 02, 2016
Filing Date:
February 18, 2016
Export Citation:
Assignee:
ZEISS CARL SMS GMBH
International Classes:
G03F1/84; G01N23/225; G03F1/24; G03F1/72
Domestic Patent References:
JP2009290002A | 2009-12-10 | |||
JP2003133206A | 2003-05-09 | |||
JP2007147941A | 2007-06-14 | |||
JP2005532581A | 2005-10-27 | |||
JP2011517127A | 2011-05-26 | |||
JP2004287321A | 2004-10-14 | |||
JP2003228161A | 2003-08-15 | |||
JP2011108726A | 2011-06-02 | |||
JP2005525565A | 2005-08-25 | |||
JP2008506138A | 2008-02-28 | |||
JP2002532738A | 2002-10-02 | |||
JP2009010373A | 2009-01-15 |
Foreign References:
WO2010072279A1 | 2010-07-01 |
Other References:
VAN DEN HEUVEL D.: "NATURAL EUV MASK BLANK DEFECTS: EVIDENCE, TIMELY DETECTION, ANALYSIS AND OUTLOOK", PROCEEDINGS OF THE SPIE, vol. V7823, JPN5014008808, 13 September 2010 (2010-09-13), US, pages 78231 - 1, ISSN: 0003628836
RIK JONCKHEERE: "EVIDENCE OF PRINTING BLANK-RELATED DEFECTS ON EUV MASKS, MISSED BY BLANK INSPECTION", PROCEEDINGS OF SPIE, vol. V7985, JPN5014008807, 2 February 2011 (2011-02-02), pages 79850 - 1, ISSN: 0003628837
RIK JONCKHEERE: "EVIDENCE OF PRINTING BLANK-RELATED DEFECTS ON EUV MASKS, MISSED BY BLANK INSPECTION", PROCEEDINGS OF SPIE, vol. V7985, JPN5014008807, 2 February 2011 (2011-02-02), pages 79850 - 1, ISSN: 0003628837
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura