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Title:
METHOD AND APPARATUS FOR ANALYZING AND REMOVING DEFECT OF EUV PHOTOMASK
Document Type and Number:
Japanese Patent JP2016103041
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure.SOLUTION: The method comprises the steps of: (a) determining first data by exposing a defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) combining the first, the second and the third data.SELECTED DRAWING: Figure 9

Inventors:
MICHAEL BUDACH
TRISTAN BRET
KLAUS EDINGER
THORSTEN HOFMANN
Application Number:
JP2016029117A
Publication Date:
June 02, 2016
Filing Date:
February 18, 2016
Export Citation:
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Assignee:
ZEISS CARL SMS GMBH
International Classes:
G03F1/84; G01N23/225; G03F1/24; G03F1/72
Domestic Patent References:
JP2009290002A2009-12-10
JP2003133206A2003-05-09
JP2007147941A2007-06-14
JP2005532581A2005-10-27
JP2011517127A2011-05-26
JP2004287321A2004-10-14
JP2003228161A2003-08-15
JP2011108726A2011-06-02
JP2005525565A2005-08-25
JP2008506138A2008-02-28
JP2002532738A2002-10-02
JP2009010373A2009-01-15
Foreign References:
WO2010072279A12010-07-01
Other References:
VAN DEN HEUVEL D.: "NATURAL EUV MASK BLANK DEFECTS: EVIDENCE, TIMELY DETECTION, ANALYSIS AND OUTLOOK", PROCEEDINGS OF THE SPIE, vol. V7823, JPN5014008808, 13 September 2010 (2010-09-13), US, pages 78231 - 1, ISSN: 0003628836
RIK JONCKHEERE: "EVIDENCE OF PRINTING BLANK-RELATED DEFECTS ON EUV MASKS, MISSED BY BLANK INSPECTION", PROCEEDINGS OF SPIE, vol. V7985, JPN5014008807, 2 February 2011 (2011-02-02), pages 79850 - 1, ISSN: 0003628837
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura