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Title:
反射防止ハードマスク組成物及びそれを用いたパターン化材料を調製する方法。
Document Type and Number:
Japanese Patent JP2013522654
Kind Code:
A
Abstract:
An antireflective hardmask composition layer including a polymer having Si—O and non-silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.

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Inventors:
Burns, Shawn, Dee
Medeiros, David, Earl
Pfeiffer, dark
Application Number:
JP2012554984A
Publication Date:
June 13, 2013
Filing Date:
October 22, 2010
Export Citation:
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Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION
International Classes:
G03F7/11; C08G77/58; C08G79/00; H01L21/027
Domestic Patent References:
JP2009126940A2009-06-11
Foreign References:
US20070015083A12007-01-18
US20040009672A12004-01-15
Attorney, Agent or Firm:
Takeshi Ueno
Tasaichi Tanae
Yoshihiro City



 
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