Title:
The method and system for forming a pattern using charged particle beam lithography
Document Type and Number:
Japanese Patent JP6140082
Kind Code:
B2
Inventors:
Fujimura Akira
Zeble, Harold Robert
Zeble, Harold Robert
Application Number:
JP2013556643A
Publication Date:
May 31, 2017
Filing Date:
February 15, 2012
Export Citation:
Assignee:
D2S, INC.
International Classes:
H01L21/027; G03F1/36; G03F1/50; G03F7/20; H01J37/305
Domestic Patent References:
| JP2010062562A |
Attorney, Agent or Firm:
Fukami patent office
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