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Title:
新規化合物、それを用いた高分子、及び高分子を含む組成物
Document Type and Number:
Japanese Patent JP4754071
Kind Code:
B2
Abstract:
A composition comprising a polymer containing a compound represented by Formula (1) or a salt thereof as a constituent monomer, or a polymer containing a structure represented by Formula (9) as a partial structure is used for protecting or improving skin. In the formula, R1, R2 and R3 each independently represent hydrogen atom, an alkyl group, an alkoxyl group, or an alkylamino group; R4 represents an amino acid residue, a polyamine residue, or an aminoalcohol residue; and X represents oxygen atom or a group represented as NH. In the formula, R1, R2 and R3 each independently represent hydrogen atom, an alkyl group, an alkoxyl group, or an alkylamino group; R4 represents an amino acid residue, a polyamine residue, or an aminoalcohol residue; and X represents oxygen atom or a group represented as NH.

Inventors:
Michio Ochiai
Takao Hattori
Yoshio Kitada
Hideo Kuroda
Oikawa Midori
Satoshi Ichinomiya
Application Number:
JP2000585202A
Publication Date:
August 24, 2011
Filing Date:
December 02, 1999
Export Citation:
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Assignee:
POLA Kasei Kogyo Co., Ltd.
International Classes:
A61K8/81; A61Q17/00; A61Q19/00; C07C219/08; C07C233/49; C07C279/14; C07C311/41; C08F20/34; C08F20/36; C08F20/60; C07C233/38; C07C311/39; C08L33/26
Domestic Patent References:
JPH0782129A1995-03-28
JPH04213311A1992-08-04
JPH0570321A1993-03-23
Attorney, Agent or Firm:
Tsutomu Toyama
Hidemi Matsukura
Yoshiyuki Kawaguchi