Title:
パターン形成方法及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP4789620
Kind Code:
B2
Abstract:
A pattern formation method includes the steps of forming a flowable film made of a material with flowability; transferring at least one of a concave portion and a convex portion provided on a pressing face of a pressing member onto the flowable film by pressing the pressing face of the pressing member against the flowable film; forming a solidified film by solidifying the flowable film, onto which the at least one of a concave portion and a convex portion has been transferred, through annealing of the flowable film at a first temperature with the pressing face pressed against the flowable film; and forming a pattern made of the solidified film burnt by annealing the solidified film at a second temperature higher than the first temperature.
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Inventors:
Hideo Nakagawa
Masako Sasako
Yoshihiko Hirai
Masako Sasako
Yoshihiko Hirai
Application Number:
JP2005507249A
Publication Date:
October 12, 2011
Filing Date:
June 14, 2004
Export Citation:
Assignee:
Panasonic Corporation
International Classes:
H01L21/316; G03C5/00; G03F7/00; G03F9/00; H01L21/027; H01L21/302; H01L21/31; H01L21/312; H01L21/3205; H01L21/44; H01L21/461; H01L21/469; H01L21/768
Domestic Patent References:
| JP2002158221A | 2002-05-31 | |||
| JPH06267943A | 1994-09-22 | |||
| JP2003077807A | 2003-03-14 | |||
| JP2001252927A | 2001-09-18 |
Attorney, Agent or Firm:
Hiroshi Maeda
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura
Daisuke Kawabe
Masanori Hasegawa
Tsuguya Iwashita
Koji Fukumoto
Ryo Maeda
Mawaki Hachizo
Yukichi Matsunaga
Kenji Kawakita
Shohei Okazawa
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura
Daisuke Kawabe
Masanori Hasegawa
Tsuguya Iwashita
Koji Fukumoto
Ryo Maeda
Mawaki Hachizo
Yukichi Matsunaga
Kenji Kawakita
Shohei Okazawa