Title:
PLASMA GENERATION METHOD AND PLASMA GENERATOR
Document Type and Number:
Japanese Patent JP2017216164
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma generation method and a plasma generator which enable high-performance plasma treatment by efficiently generating plasma.SOLUTION: A plasma generation part 1 has a reflux part 60 arranged between tips of conductor wires 58 and 59. A fluid flows down a portion between the tips of the conductor wires 58 and 59 abuts against and bounces off a curved surface 76, thereby creating a reflux which returns to a space 68. If the fluid flows down in just one direction, it passes between the tips of the conductor wires 58 and 59 only once. This causes a risk that a plasma treatment effect may be inefficient. When the fluid is subjected to a reflux action by the reflux part 60, it becomes turbulent near the portion between the tips of the conductor wires 58 and 59. As a result, the fluid is applied with high-voltage, high-frequency pulses a number of times so as to repeatedly cause high-voltage discharges, thereby allowing plasma to be generated in an efficient manner.SELECTED DRAWING: Figure 2
More Like This:
| JP4683418 | Plasma CVD equipment |
| JP2024003252 | High power ion beam generator system and method |
| WO/2008/078508 | PLASMA GENERATING BODY AND REACTION DEVICE |
Inventors:
NISHIMURA YOSHIMI
Application Number:
JP2016109536A
Publication Date:
December 07, 2017
Filing Date:
May 31, 2016
Export Citation:
Assignee:
KURITA SEISAKUSHO KK
International Classes:
H05H1/24
Domestic Patent References:
| JP2016081676A | 2016-05-16 | |||
| JP2013123656A | 2013-06-24 |
Attorney, Agent or Firm:
Hisami Miki
Previous Patent: Lighting installation
Next Patent: An interlocking part article and a circuit breaker
Next Patent: An interlocking part article and a circuit breaker