Title:
A porous silicon system particle, this manufacturing method, and the cathode active material containing this
Document Type and Number:
Japanese Patent JP6037052
Kind Code:
B2
Abstract:
The present invention provides porous silicon based particles and a method for preparing the same, the porous silicon based particles characterized by comprising Si or SiOx(0
Inventors:
Yoo, Jun Woo
Lee, Mirim
Lee, Young Ju
Kim, Eun Kyun
Lee, Han Ho
Yoon, Ji Hyun
Van, byun man
Lee, Chang Lae
Jeon, Ilkyo
Lee, Mikyon
Lee, Mirim
Lee, Young Ju
Kim, Eun Kyun
Lee, Han Ho
Yoon, Ji Hyun
Van, byun man
Lee, Chang Lae
Jeon, Ilkyo
Lee, Mikyon
Application Number:
JP2015550344A
Publication Date:
November 30, 2016
Filing Date:
August 29, 2014
Export Citation:
Assignee:
LG HAUSYS,LTD.
SJ Materials Company Limited
SJ Materials Company Limited
International Classes:
C01B33/02; C01B33/021; C01B33/113; H01M4/36; H01M4/38; H01M4/48; H01M4/587
Domestic Patent References:
| JP2012082126A | ||||
| JP2013523588A | ||||
| JP2012084521A | ||||
| JP2009032693A | ||||
| JP6089891A | ||||
| JP2013514252A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation
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