Title:
近接効果補正を制御するためのプロセス
Document Type and Number:
Japanese Patent JP4871536
Kind Code:
B2
Abstract:
A process for controlling the proximity effect correction in an electron beam lithography system. The exposure is controlled in order to obtain resulting pattern after processing which is conform to design data. In a first step an arbitrary set patterns is exposed without applying the process for controlling the pro
Inventors:
Peter Fudek
Dirk Buyer
Dirk Buyer
Application Number:
JP2005188343A
Publication Date:
February 08, 2012
Filing Date:
June 28, 2005
Export Citation:
Assignee:
Vistec Electron Beam Game Beamer
International Classes:
H01L21/027; G03C5/00; G03F1/00; G03F7/20; H01J37/317
Domestic Patent References:
| JP11204415A | ||||
| JP11274043A | ||||
| JP11260694A | ||||
| JP63086518A | ||||
| JP63058829A | ||||
| JP61198630A | ||||
| JP61156813A | ||||
| JP2005019780A | ||||
| JP2004140311A | ||||
| JP2003151885A | ||||
| JP2001244165A | ||||
| JP9186058A | ||||
| JP7115046A |
Attorney, Agent or Firm:
Fujita Akira