Title:
基板を処理する方法、基板及び該方法を行なうための処理装置
Document Type and Number:
Japanese Patent JP2012502491
Kind Code:
A
Abstract:
In a method for the treatment of substrates (13) for solar cells composed of silicon, after multiple etching the substrates are cleaned (18) with DI water. Afterwards, the substrates (13) are dried and heated in drying stations (22, 25). The heated substrates (13) are subsequently oxidized in an oxidation station (30) by means of oxidation gas (34) with a proportion of ozone.
Inventors:
Harbelman, Dirk
Application Number:
JP2011526407A
Publication Date:
January 26, 2012
Filing Date:
September 10, 2009
Export Citation:
Assignee:
Gebrüder Schmidt Gezel Shaft Mitt Beschlenktel Haftung
International Classes:
F26B15/12; H01L21/304; H01L21/316; H01L31/04
Domestic Patent References:
| JP2004538635A | 2004-12-24 | |||
| JPH09503099A | 1997-03-25 | |||
| JPH01226159A | 1989-09-08 | |||
| JP2004214490A | 2004-07-29 | |||
| JPH1140531A | 1999-02-12 | |||
| JPH0483340A | 1992-03-17 |
Foreign References:
| WO2002027775A1 | 2002-04-04 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Satoshi Deno
Nagasaka Tomoyasu
Shunsuke Mima
Takashi Ishida
Tetsuji Koga
Satoshi Deno
Nagasaka Tomoyasu
Shunsuke Mima