Title:
A resist composition and a resist pattern formation method
Document Type and Number:
Japanese Patent JP6076029
Kind Code:
B2
Abstract:
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid generator component (B) which generates an acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0) containing an acid decomposable group that exhibits increased polarity by the action of acid and a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group, and the acid generator component (B) including an acid generator (B1) containing a compound having a nitrogen atom exhibiting a proton acceptor property and an acid generating site capable of generating an acid upon exposure in the same molecule thereof.
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Inventors:
Tomohiro Ikukawa
Application Number:
JP2012232370A
Publication Date:
February 08, 2017
Filing Date:
October 19, 2012
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07C381/12; C09K3/00; G03F7/038; G03F7/039
Domestic Patent References:
| JP2012093737A | ||||
| JP2011203646A | ||||
| JP2001166482A | ||||
| JP2012058268A | ||||
| JP200953688A | ||||
| JP2012123189A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi