Title:
A resist lower layer film formation constituent containing alicyclic skeleton content carbazole resin
Document Type and Number:
Japanese Patent JP6041104
Kind Code:
B2
Abstract:
There is provided a resist underlayer film used in lithography process that has a high n value and a low k value, and can effectively reduce reflection of light having a wavelength of 193 nm from the substrate in a three-layer process in which the resist underlayer film is used in combination with a silicon-containing intermediate layer. A resist underlayer film-forming composition used in lithography process including: a polymer containing a unit structure including a product obtained by reaction of a condensed heterocyclic compound and a bicyclo ring compound. The condensed heterocyclic compound is a carbazole compound or a substituted carbazole compound. The bicyclo ring compound is dicyclopentadiene, substituted dicyclopentadiene, tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene, or substituted tetracyclo[4.4.0.12,5.17,10]dodeca-3,8-diene.
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Inventors:
Tetsuya Shinshiro
Someya Yasunobu
Keisuke Hashimoto
Ryo Ezawa
Someya Yasunobu
Keisuke Hashimoto
Ryo Ezawa
Application Number:
JP2013523046A
Publication Date:
December 07, 2016
Filing Date:
July 05, 2012
Export Citation:
Assignee:
Nissan Chemical Industry Co., Ltd.
International Classes:
G03F7/11; C08G61/12; G03F7/26; H01L21/027
Domestic Patent References:
| JP2009534710A | ||||
| JP2008096684A | ||||
| JP2010528334A |
Foreign References:
| WO2012077640A1 | ||||
| WO2010147155A1 | ||||
| US20080292995 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Tsutomu Kato
Companion wisdom
Miyazaki Yoshio
Tsutomu Kato
Companion wisdom
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