Title:
A substrate processing device provided with substrate maintenance slewing mechanism and it, and a substrate treating method
Document Type and Number:
Japanese Patent JP6037439
Kind Code:
B2
Abstract:
A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other.
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Inventors:
Hiroshi Kato
Application Number:
JP2012255548A
Publication Date:
December 07, 2016
Filing Date:
November 21, 2012
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/683; H01L21/027
Domestic Patent References:
JP9232269A | ||||
JP2001332486A | ||||
JP8323274A | ||||
JP2004128295A | ||||
JP9167751A | ||||
JP2005142585A | ||||
JP201012591A | ||||
JP7130695A | ||||
JP2008108790A | ||||
JP2010130020A | ||||
JP9213772A |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Masahide Yasuda
Mio Kawasaki
Masahide Yasuda