Title:
ACRYLATE RESIN, PHOTORESIST COMPOSITION COMPRISING SAME, AND PHOTORESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2011/053100
Kind Code:
A2
Abstract:
The present invention relates to an acrylate resin contained in a chemically amplified photoresist for forming a thick film, a chemically amplified photoresist composition comprising the same, and a photoresist pattern prepared therefrom. Sensitivity can be improved by using the photoresist composition comprising the acrylate resin according to the present invention without deterioration of main characteristics such as compatibility (dispersion stability), coatability, development and resolution. In addition, a thick film resist pattern can be formed from the composition, and the pattern is excellent in sensitivity, development, patterning property, crack resistance and plating resistance.
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Inventors:
SEONG HYE RAN (KR)
AHN KYOUNG HO (KR)
KIM YU NA (KR)
KIM KYUNG JUN (KR)
AHN KYOUNG HO (KR)
KIM YU NA (KR)
KIM KYUNG JUN (KR)
Application Number:
PCT/KR2010/007678
Publication Date:
May 05, 2011
Filing Date:
November 02, 2010
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
SEONG HYE RAN (KR)
AHN KYOUNG HO (KR)
KIM YU NA (KR)
KIM KYUNG JUN (KR)
SEONG HYE RAN (KR)
AHN KYOUNG HO (KR)
KIM YU NA (KR)
KIM KYUNG JUN (KR)
International Classes:
G03F7/039; G03F7/027
Foreign References:
| US6045970A | 2000-04-04 | |||
| US6083659A | 2000-07-04 | |||
| JPH0572738A | 1993-03-26 | |||
| JP2003177541A | 2003-06-27 |
Attorney, Agent or Firm:
KIM, In Han et al. (KR)
김인한 (KR)
김인한 (KR)
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