ACTIVE ELEMENT SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS USING ACTIVE ELEMENT SUBSTRATE MANUFACTURED BY THIS MANUFACTURING METHOD

WIPO Patent Application WO2010110179

A1

Provided are an active element substrate and a manufacturing method thereof, wherein the number of photolithographic processes is reduced and the manufacturing cost is reduced, and a display apparatus using an active element substrate manufactured by this manufacturing method. In a process to form pixels on an active substrate which constitutes a display apparatus, a photo resist film or a black photo resist film formed on an active element and a display electrode by coating is subjected to half-tone exposure to form a bank or etching pattern to thereby process an insulation film and a transparent conductive film or a color filter is formed by an ink-jet method.

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SAITO HIROSHI (JP)
NODA YOICHI (JP)
YAMAMOTO YOSHITAKA (JP)

PCT/JP2010/054724

September 30, 2010

March 12, 2010

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FUTURE VISION INC (JP)
SAITO HIROSHI (JP)
NODA YOICHI (JP)
YAMAMOTO YOSHITAKA (JP)

G02F1/1343; G09F9/30; G02F1/1368; G09F9/00; H01L21/3205; H01L21/336; H01L21/768; H01L23/52; H01L29/417; H01L29/423; H01L29/49; H01L29/786

JP2007053333A	2007-03-01
JP2002250935A	2002-09-06
JP2000353594A	2000-12-19
JP2003318131A	2003-11-07
JP2007034151A	2007-02-08

ONODERA YOJI (JP)
Yoji Onodera (JP)

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