ADDITION COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER

WIPO Patent Application WO/2011/129182

A1

Disclosed is a photosensitive resin composition which is characterized by containing a solvent (B) and an addition copolymer (A) that is obtained by adding a monomer (a-4) having a hydroxyl group to a copolymer that is obtained by copolymerizing 2-60% by mole of a monomer (a-1) that has a bridged cyclic hydrocarbon group having 10-20 carbon atoms and/or a monomer (a-1') that is represented by general formula (1), 30-88% by mole of an unsaturated polybasic acid anhydride (a-2) and 10-68% by mole of a copolymerizable monomer (a-3) that is other than the components (a-1), (a-1') and (a-2). The photosensitive resin composition is capable of providing a color pattern that exhibits good sensitivity and developability, while having excellent thermal decomposition resistance and solvent resistance. (In general formula (1), X and Y each independently represents a hydrogen atom or a linear or branched hydrocarbon group having 1-4 carbon atoms; R1 and R2 each independently represents a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms or a carboxyl group; and R1 and R2 may combine together to form a cyclic structure.)

KINOSHITA TAKEHIRO (JP)
KOMORI YASUHIRO (JP)
KAWAGUCHI YASUAKI (JP)

PCT/JP2011/056991

October 20, 2011

March 23, 2011

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SHOWA DENKO KK (JP)
KINOSHITA TAKEHIRO (JP)
KOMORI YASUHIRO (JP)
KAWAGUCHI YASUAKI (JP)

G03F7/038; C08F8/00; C08F290/12; G02B5/20; G02B5/22; G03F7/004

JPH07209865A	1995-08-11
JP2001272778A	2001-10-05
JP2005519345A	2005-06-30

SOGA, Michiharu et al. (JP)
Michiharu Soga (JP)

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