Title:
AERODYNAMIC CHAMBER DESIGN FOR HIGH PULSE REPETITION RATE EXCIMER LASERS
Document Type and Number:
WIPO Patent Application WO1998037601
Kind Code:
A3
Abstract:
An excimer laser chamber capable of arc-free operation at repetitive pulse rates of 1 kHz or greater is provided. The chamber balances the electrode design criteria required to produce a well-defined discharge channel with the flow design criteria required to achieve high clearing rates at comparatively high blower efficiency. A ceramic insulator located on either side of the cathode/pre-ionizer assembly enhances the flow of gas through the discharge region by reducing the turbulence in the electrode region. A series of specifically designed flow vanes further enhance the gas flow. The gas exiting the blower fan is guided into the discharge region with one vane. The anode support bar is extended downwardly, thus improving the efficiency of the tangential blower and also minimizing the amount of gas bypassing the discharge region. A pair of vanes downstream from the discharge region smoothly direct the heated gas towards the heat exchanger. These vanes reduce the collapse of the flow velocity as it leaves the electrode region, thus minimizing turbulence.
Inventors:
MORTON RICHARD G (US)
FOMENKOV IGOR V (US)
PARTLO WILLIAM N (US)
FOMENKOV IGOR V (US)
PARTLO WILLIAM N (US)
Application Number:
PCT/US1998/002041
Publication Date:
November 19, 1998
Filing Date:
February 04, 1998
Export Citation:
Assignee:
CYMER INC (US)
MORTON RICHARD G (US)
FOMENKOV IGOR V (US)
PARTLO WILLIAM N (US)
MORTON RICHARD G (US)
FOMENKOV IGOR V (US)
PARTLO WILLIAM N (US)
International Classes:
H01S3/036; H01S3/097; H01S3/225; (IPC1-7): H01S/
Foreign References:
| US5377215A | 1994-12-27 | |||
| US5373523A | 1994-12-13 | |||
| US5319663A | 1994-06-07 |
Other References:
See also references of EP 1008210A4
Download PDF: