Title:
ALIGNER
Document Type and Number:
WIPO Patent Application WO/2007/029561
Kind Code:
A1
Abstract:
An aligner comprising a stage (13) having an upper surface (13a) for mounting
a color filter substrate (11), a mask stage (6) arranged above the stage (13) such
that a stripe photomask (5) can be held on the upper surface of the stage (13) in
parallel therewith, and a light source (2) for irradiating the photomask (5)
held on the mask stage (6) with exposure light, and forming a predetermined exposure
pattern at a predetermined position by irradiating the color filter substrate
(11) with exposure light radiated from the light source (2) through the photomask
(5). A cylindrical lens (14) for shaping the cross-sectional profile of the beams
of exposure light radiated from the light source (2) in accordance with the profile
of the stripe photomask (5) is arranged on the optical path between the light source
(2) and the mask stage (6). Consequently, utilization efficiency of exposure
light radiated for the stripe photomask is enhanced.
Inventors:
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
WATANABE YOSHIO (JP)
Application Number:
PCT/JP2006/316956
Publication Date:
March 15, 2007
Filing Date:
August 29, 2006
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
KAJIYAMA KOICHI (JP)
WATANABE YOSHIO (JP)
International Classes:
G03F7/20; H01L21/027
Foreign References:
| JP2003255552A | 2003-09-10 | |||
| JPH09281711A | 1997-10-31 | |||
| JP2001068409A | 2001-03-16 | |||
| JPH08304732A | 1996-11-22 | |||
| JP2000114160A | 2000-04-21 | |||
| JPH09232226A | 1997-09-05 | |||
| JPS636501A | 1988-01-12 | |||
| JPH07249561A | 1995-09-26 | |||
| JPH09274323A | 1997-10-21 | |||
| JP2001350271A | 2001-12-21 |
Attorney, Agent or Firm:
SASAJIMA, Fujio et al. (19-5 Toranomon 1-chome, Minato-k, Tokyo 01, JP)
Download PDF: