Title:
ALIGNMENT MARK STRUCTURE AND FORMING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2024/060361
Kind Code:
A1
Abstract:
The present disclosure provides an alignment mark structure and a forming method therefor. The alignment mark structure comprises: a substrate (1); a marking region (2), comprising an alignment structure (2-2) and a chamfer structure layer (2-1), the alignment structure (2-2) being formed in the substrate (1) and being a recessed structure, the chamfer structure layer (2-1) being formed on the surface of the substrate (1) and being a raised structure, and the chamfer structure layer (2-1) forming a raised chamfer structure at an edge of the alignment structure (2-2); and a non-marking region (6), disposed around the periphery of the marking region (2), an upper surface of the non-marking region (6) being lower than a lower surface of the chamfer structure layer (2-1) in the marking region (2). According to the alignment mark structure of the present disclosure, the definition and contrast of alignment mark detection can be effectively improved.
Inventors:
LUO XIANGANG (CN)
ZHANG YIYIN (CN)
LUO YUNFEI (CN)
LIU KAIPENG (CN)
ZHU YAOYAO (CN)
ZHAO ZEYU (CN)
ZHANG YIYIN (CN)
LUO YUNFEI (CN)
LIU KAIPENG (CN)
ZHU YAOYAO (CN)
ZHAO ZEYU (CN)
Application Number:
PCT/CN2022/129510
Publication Date:
March 28, 2024
Filing Date:
November 03, 2022
Export Citation:
Assignee:
INST OPTICS & ELECTRONICS CAS (CN)
International Classes:
H01L23/544
Foreign References:
| CN111883430A | 2020-11-03 | |||
| CN104900630A | 2015-09-09 | |||
| CN102543667A | 2012-07-04 | |||
| CN112563246A | 2021-03-26 | |||
| CN104733371A | 2015-06-24 | |||
| CN114967376A | 2022-08-30 | |||
| US20140134827A1 | 2014-05-15 |
Attorney, Agent or Firm:
CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)
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