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Title:
ALIGNMENT METHOD AND FLAT PANEL DISPLAY MANUFACTURE METHOD
Document Type and Number:
WIPO Patent Application WO/2011/111327
Kind Code:
A1
Abstract:
Disclosed is an alignment method that sets the distance between a substrate and a photomask to a prescribed exposure gap. The photomask is rectangular in shape and includes a first side and a second side in opposition to the first side. The distance between the midpoint of the first side and the substrate is matched to the exposure gap. By rotating the photomask with a line joining the midpoint of the first side with the midpoint of the second side as an axis, the distances between each end of the first side and the substrate are matched to the exposure gap. By rotating the photomask with the first side as the axis, the distance between the midpoint of the second side and the substrate is matched to the exposure gap.

Inventors:
HAMADA RYOTA
MURAKOSO TOMOHIRO
Application Number:
PCT/JP2011/001132
Publication Date:
September 15, 2011
Filing Date:
February 28, 2011
Export Citation:
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Assignee:
PANASONIC CORP (JP)
HAMADA RYOTA
MURAKOSO TOMOHIRO
International Classes:
G03F9/00; G03F7/207; H01J9/02; H01J11/12; H01J11/22
Foreign References:
JP2007179777A2007-07-12
JP2007171451A2007-07-05
JP2000035676A2000-02-02
JP3070365B22000-07-31
JPH01250891A1989-10-05
JPS62279629A1987-12-04
JPS5830128A1983-02-22
Attorney, Agent or Firm:
NAITO, Hiroki et al. (JP)
Hiroki Naito (JP)
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