Title:
ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2016/047703
Kind Code:
A1
Abstract:
This alkali-soluble resin comprises a copolymer dissolved in a solvent, the copolymer including a polymeric unit containing a carboxyl group based on an unsaturated carboxylic acid, etc. and a polymeric unit containing an alkoxysilyl group based on a monomer of formula (1) below. The solvent is a specific alcohol having a linear or branched chain alkyl group having 4 or 5 carbon atoms. The specific alcohol is preferably a primary alcohol with an alkyl group having 4 carbon atoms, and more preferably 1-butanol.
X-(CH2)a-Si(OR)b(CH3)3-b (1)
In formula (1), X is a vinyl group, styryl group, or (meth)acryloyl group, R is a methyl group or ethyl group, a is an integer of 0-3, and b is an integer of 1-3.
Inventors:
KUZAWA MASAHIRO (JP)
FUKATSU YUTA (JP)
IIDA HIROO (JP)
FUKATSU YUTA (JP)
IIDA HIROO (JP)
Application Number:
PCT/JP2015/076970
Publication Date:
March 31, 2016
Filing Date:
September 24, 2015
Export Citation:
Assignee:
NATOCO CO LTD (JP)
International Classes:
C08L101/10; C08K5/05; G03F7/075
Foreign References:
| JPS60206812A | 1985-10-18 | |||
| JPS60206802A | 1985-10-18 | |||
| JPH02233709A | 1990-09-17 | |||
| JP2011105903A | 2011-06-02 | |||
| JP2009133891A | 2009-06-18 | |||
| JP2013101240A | 2013-05-23 | |||
| JP2006209112A | 2006-08-10 | |||
| JP2013053312A | 2013-03-21 | |||
| JP2011033679A | 2011-02-17 | |||
| JPS59231534A | 1984-12-26 |
Attorney, Agent or Firm:
ONDA, Makoto et al. (JP)
Makoto Onda (JP)
Makoto Onda (JP)
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