ALKENYLPHENOL COPOLYMER AND PROCESS FOR PRODUCING THE SAME

Title:

ALKENYLPHENOL COPOLYMER AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2001/018083

Kind Code:

A1

Abstract:

An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.

Inventors:

MATSUMOTO HITOSHI (JP)
NOBUHARA YUKIKAZU (JP)
KIMIZUKA SHINICHI (JP)

Application Number:

PCT/JP2000/005958

Publication Date:

March 15, 2001

Filing Date:

September 01, 2000

Export Citation:

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Assignee:

NIPPON SODA CO (JP)
MATSUMOTO HITOSHI (JP)
NOBUHARA YUKIKAZU (JP)
KIMIZUKA SHINICHI (JP)

International Classes:

C08F8/00; C08F297/02; (IPC1-7): C08F297/02

Foreign References:

EP0898201A1	1999-02-24
JPH10265524A	1998-10-06
JPS59199705A	1984-11-12
JPH10168132A	1998-06-23

Other References: