AMORPHOUS CARBON FILM AND METHOD FOR FORMING SAME

WIPO Patent Application WO/2012/144580

A1

Provided are: a film forming method which enables the formation of a good amorphous carbon film using a power supply for a bipolar PBII device in a low vacuum; and an amorphous carbon film which is obtained by the film forming method. A method for forming an amorphous carbon film using a power supply for a bipolar PBII device in a low vacuum (at about 1,000-30,000 Pa), wherein a power supply-side electrode (3) that is connected to a power supply (6) for a PBII device and an earth-side electrode (4) that faces the electrode (3) are arranged within a chamber (1), a base (2) is disposed on the power supply-side electrode (3) or the earth-side electrode (4), and an amorphous carbon film is formed on the surface of the base (2) by generating plasma of a rare gas and a hydrocarbon-containing gas between the base (2) and the electrode on which the base (2) is not disposed.

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OOHIRA KOUYA
NAKANISHI MASAKI
TAGUCHI YOSUKE
NAKAO SETSUO

PCT/JP2012/060664

October 26, 2012

April 20, 2012

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NTN TOYO BEARING CO LTD (JP)
NAT INST OF ADVANCED IND SCIEN (JP)
OOHIRA KOUYA
NAKANISHI MASAKI
TAGUCHI YOSUKE
NAKAO SETSUO

C23C14/14; C23C16/26

JP2007194110A	2007-08-02
JP2002363758A	2002-12-18
JPS6433096A	1989-02-02
JP2003147526A	2003-05-21
JP2006200029A	2006-08-03
JP2009263769A	2009-11-12
JP2010196879A	2010-09-09
JP2001280494A	2001-10-10
JP2004270022A	2004-09-30

WAKI, Misao et al. (JP)
Wake 操 (JP)

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