Title:
ANALYSIS SYSTEM, EXPOSURE DEVICE, DEVICE PRODUCTION METHOD, DISPLAY PRODUCTION METHOD, AND ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2022/230788
Kind Code:
A1
Abstract:
The present invention provides an analysis system which makes it possible to identify, from among a plurality of substrate processing devices, a device which has caused a deformation amount of a substrate. Given a first processing device (21) that has a first device (110) and a second device (111) and that subjects substrates to a first process and a second processing device (22) that has a third device (121) and a fourth device (122) and that subjects the substrates to a second process, when the substrates are subjected to the first process and the second process along any of a first route passing through the first device and the third device, a second route passing through the first device and the fourth device, a third route passing through the second device and the third device, and a fourth route passing through the second device and the fourth device, an analysis system (10) analyzes measurement information (MI) obtained from an inspection device (220) for measuring processing results of first to fourth substrates which have respectively passed through the first to fourth routes. The analysis system (10) comprises: a route information acquisition unit (310) that acquires substrate identification information (SID) and route identification information (RID); a measurement information acquisition unit (320) that acquires the substrate identification information and the measurement information; and a calculation unit (330) that calculates, on the basis of the route identification information and the measurement information, first to fourth device characteristics which occur in the first to fourth substrates due to the processes in the first to fourth devices.
Inventors:
MIYAZAKI SEIJI (JP)
MUTO TAKAKAZU (JP)
HIGUCHI KIYOSHI (JP)
KOIKE TETSUYA (JP)
TAKAHASHI TETSUHIRO (JP)
OTANI NAOYA (JP)
KASHIWAMURA YOSHIKI (JP)
MUTO TAKAKAZU (JP)
HIGUCHI KIYOSHI (JP)
KOIKE TETSUYA (JP)
TAKAHASHI TETSUHIRO (JP)
OTANI NAOYA (JP)
KASHIWAMURA YOSHIKI (JP)
Application Number:
PCT/JP2022/018649
Publication Date:
November 03, 2022
Filing Date:
April 25, 2022
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F9/00; G03F7/20; H01L21/02; H01L27/32; H01L51/50; H05B33/10
Domestic Patent References:
| WO2019233743A1 | 2019-12-12 |
Foreign References:
| JP2020034682A | 2020-03-05 | |||
| JP2007214218A | 2007-08-23 | |||
| JP2013503493A | 2013-01-31 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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