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Patent Searching and Data


Title:
ANTI-REFLECTION FILM AND DEEP ULTRAVIOLET LIGHT EMITTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/123898
Kind Code:
A1
Abstract:
Provided is an anti-reflection film which exhibits excellent moisture resistance, while having low reflectance even with respect to oblique incidence of deep ultraviolet light, and which is suitable for use in deep ultraviolet light emitting devices. An anti-reflection film according to the present invention is provided with a first layer having a first refractive index, a second layer having a second refractive index and a third layer having a third refractive index, said layers being disposed on a window material. At a wavelength of 280 nm, the first refractive index is from 1.6 to 2.0 (inclusive), the second refractive index is from 2.0 to 2.7 (inclusive) and is higher than the first refractive index, and the third refractive index is from 1.3 to 1.6 (inclusive) and is lower than the first refractive index. The materials constituting the first refractive index, the second refractive index and the third refractive index are configured from oxides that are different from each other.

Inventors:
MARUYAMA Tsukasa (4-14-1, Sotokand, Chiyoda-ku Tokyo 21, 〒1010021, JP)
Application Number:
JP2017/046217
Publication Date:
July 05, 2018
Filing Date:
December 22, 2017
Export Citation:
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Assignee:
DOWA ELECTRONICS MATERIALS CO., LTD. (4-14-1, Sotokanda Chiyoda-ku Tokyo, 21, 〒1010021, JP)
International Classes:
G02B1/115; H01L33/60
Foreign References:
JPH11264902A1999-09-28
JP2002311209A2002-10-23
JP2012244170A2012-12-10
JP2001013304A2001-01-19
JP2002250801A2002-09-06
JPH07244202A1995-09-19
Attorney, Agent or Firm:
SUGIMURA Kenji (36F Kasumigaseki Common Gate West, 3-2-1 Kasumigasek, Chiyoda-ku Tokyo 13, 〒1000013, JP)
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