ANTIREFLECTION FILM AND ITS USE ON A SUBSTRATE

WIPO Patent Application WO/2017/216592

A3

The present invention relates to an antireflection film, as well as its use on a substrate (3) to decrease a fracture of light striking the substrate (3) reflected by said substrate (3), wherein said coating is formed of a transparent first layer (1) applied on the substrate (3) and a transparent second layer (2) on said first layer (1). The essence of the solutions according to the present invention is that thickness (d1) of the first layer (1) ranges from 10 to 70 nm and refractive index (ni) of said first layer (1) satisfies the relation 1.05