Title:
ANTIREFLECTION STRUCTURE AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
WIPO Patent Application WO/2008/001936
Kind Code:
A1
Abstract:
Disclosed are an antireflection structure and a production method thereof.
Specifically disclosed is an antireflection structure which can be easily mass-produced
at low cost. The antireflection structure has a surface which is provided with
an antireflection arrangement for suppressing reflection of incident light
wherein a plurality of fine projections are arranged. Each projection has a columnar
first projected portion and a columnar second projected portion which is arranged
on top of the first projected portion and smaller than the first projected portion
when viewed in plan.
Inventors:
TAMURA TAKAMASA
UMETANI MAKOTO
ISHIMARU KAZUHIKO
UMETANI MAKOTO
ISHIMARU KAZUHIKO
Application Number:
PCT/JP2007/063243
Publication Date:
January 03, 2008
Filing Date:
July 02, 2007
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD (JP)
TAMURA TAKAMASA
UMETANI MAKOTO
ISHIMARU KAZUHIKO
TAMURA TAKAMASA
UMETANI MAKOTO
ISHIMARU KAZUHIKO
International Classes:
G02B1/11; G02B1/118
Foreign References:
| JP2005173120A | 2005-06-30 |
Attorney, Agent or Firm:
MAEDA, Hiroshi et al. (5-7 Hommachi 2-chome,Chuo-ku, Osaka-shi, Osaka 53, JP)
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