Title:
APPARATUS AND METHOD FOR TREATING A WORKPIECE USING PLASMA GENERATED FROM MICROWAVE RADIATION
Document Type and Number:
WIPO Patent Application WO2003056601
Kind Code:
A3
Abstract:
An apparatus and method that generates plasma using a microwave radiation supply. The plasma is used to treat a surface of a workpiece at approximately atmospheric pressure. Plasma excites a working gas to create an excited gaseous species without degradation from undue heat caused by the plasma. The gaseous species exit an outlet of the apparatus to treat the surface of a workpiece when the outlet is juxtaposed with the workpiece.
Inventors:
SHANOV VESSELIN NIKOLOV
MCDANIEL JOHN ANDREW
MIRALAI SEYED FARHAD
DATTA SASWATTI
MCDANIEL JOHN ANDREW
MIRALAI SEYED FARHAD
DATTA SASWATTI
Application Number:
PCT/US2002/040231
Publication Date:
January 15, 2004
Filing Date:
December 17, 2002
Export Citation:
Assignee:
PROCTER & GAMBLE (US)
International Classes:
H01J37/32; H05H1/24; (IPC1-7): H01J37/32; C23C16/511; C23C16/513; H05H1/30
Domestic Patent References:
| WO2001093315A2 | 2001-12-06 | |||
| WO2001032949A1 | 2001-05-10 |
Foreign References:
| US4138306A | 1979-02-06 | |||
| US5084126A | 1992-01-28 | |||
| US5423942A | 1995-06-13 | |||
| US4652723A | 1987-03-24 | |||
| EP0610728A1 | 1994-08-17 |
Download PDF:
Previous Patent: FAULT CURRENT LIMITING SYSTEM
Next Patent: SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING
Next Patent: SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING