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Title:
AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2019/208685
Kind Code:
A1
Abstract:
According to the present invention, an aqueous composition can be provided, the aqueous composition containing: (A) 0.001-20 mass% of at least one fluorine-containing compound selected from among a tetrafluoroboric acid, a hexafluorosilicic acid, a hexafluoroaluminic acid, a hexafluorotitanic acid, and salts thereof, with respect to the total amount of the composition; and (B) 0.0001-10 mass% of at least one compound selected from among a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonic acid ester, a C4-13 alkylphosphonic acid, and salts thereof, with respect to the total amount of the composition.

Inventors:
OIE TOSHIYUKI (JP)
HORITA AKINOBU (JP)
KIKUNAGA TAKAHIRO (JP)
YAMADA KENJI (JP)
Application Number:
PCT/JP2019/017587
Publication Date:
October 31, 2019
Filing Date:
April 25, 2019
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
H01L21/304; C11D7/08; C11D7/10; C11D7/14; C11D7/36; C23F1/16; C23G1/02; H01L21/308; H01L21/3205; H01L21/768
Domestic Patent References:
WO2018061670A12018-04-05
WO2017208749A12017-12-07
WO2018061365A12018-04-05
Foreign References:
JP2016527707A2016-09-08
JP2017519862A2017-07-20
JP2013533631A2013-08-22
JP2017025326A2017-02-02
JP2013533631W
JP2016171294A2016-09-23
JP2006083376A2006-03-30
Other References:
M PADMANABAN ET AL., J. PHOTOPOLYM. SCI. TECHNOL., vol. 27, 2014, pages 503
"Etch stop materials for release by vapor HF etching", 16TH MME WORKSHOP, GOETEBORG, SWEDEN, 2005
See also references of EP 3787008A4
Attorney, Agent or Firm:
KOBAYASHI Hiroshi et al. (JP)
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